1. WO2026174335 - METHOD FOR DETERMINING AT LEAST TWO CRITICAL ANGLES OF TOTAL REFLECTION IN A LIQUID PROCESS MEDIUM

Publication Number WO/2026/174335

Publication Date 27.08.2026

International Application No. PCT/AT2026/060044

International Filing Date 17.02.2026

IPC

G01N 21/41 2006.1

G	PHYSICS
01	MEASURING; TESTING
N	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21	Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
17	Systems in which incident light is modified in accordance with the properties of the material investigated
41	Refractivity; Phase-affecting properties, e.g. optical path length

G01N 21/43 2006.1

G	PHYSICS
01	MEASURING; TESTING
N	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21	Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
17	Systems in which incident light is modified in accordance with the properties of the material investigated
41	Refractivity; Phase-affecting properties, e.g. optical path length
43	by measuring critical angle

G01N 21/00 2006.1

G	PHYSICS
01	MEASURING; TESTING
N	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21	Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light

G01N 21/41 2006.1

G	PHYSICS
01	MEASURING; TESTING
N	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21	Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
17	Systems in which incident light is modified in accordance with the properties of the material investigated
41	Refractivity; Phase-affecting properties, e.g. optical path length

G01N 21/43 2006.1

G	PHYSICS
01	MEASURING; TESTING
N	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21	Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
17	Systems in which incident light is modified in accordance with the properties of the material investigated
41	Refractivity; Phase-affecting properties, e.g. optical path length
43	by measuring critical angle

G01N 21/00 2006.1

G	PHYSICS
01	MEASURING; TESTING
N	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21	Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light

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Applicants

• ANTON PAAR GMBH [AT]/[AT]

Inventors

• REITER, Peter
• HERZOG, Christoph

Agents

• WILDHACK & JELLINEK PATENTANWÄLTE GMBH

Priority Data

A 50116/2025

19.02.2025

AT

Publication Language German (de)

Filing Language German (de)

Designated States

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AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CV, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IQ, IR, IS, IT, JM, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, MG, MK, MN, MU, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UY, UZ, VC, VN, WS, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, CV, GH, GM, KE, LR, LS, MU, MW, MZ, NA, RW, SC, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, ME, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)

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Title

(DE) VERFAHREN ZUR BESTIMMUNG VON MINDESTENS ZWEI GRENZWINKELN DER TOTALREFLEXION IN EINEM FLÜSSIGEN PROZESSMEDIUM

(EN) METHOD FOR DETERMINING AT LEAST TWO CRITICAL ANGLES OF TOTAL REFLECTION IN A LIQUID PROCESS MEDIUM

(FR) PROCÉDÉ DE DÉTERMINATION D'AU MOINS DEUX ANGLES CRITIQUES DE RÉFLEXION TOTALE DANS UN MILIEU DE TRAITEMENT LIQUIDE

Abstract

(DE) Beschrieben wird ein Verfahren zur Bestimmung von mindestens zwei Grenzwinkeln der Totalreflexion in einem flüssigen Prozessmedium (10), -wobei von einer Lichtquelle (1) ein Messstrahl (8) abgestrahlt wird der einen Hauptstrahl (9) sowie eine Anzahl von Teilstrahlen (S1, S2,...) umfasst, welche gegenüber dem Hauptstrahl (9) verschiedene Winkeldifferenzen aufweisen, -wobei der Messstrahl (8) über eine Beleuchtungsoptik (2) in ein Messprisma (3) eingestrahlt wird, -wobei das Messprisma (3) aus Saphir besteht, -wobei das Messprisma (3) zumindest eine Messfläche (31) aufweist, an der der Messstrahl (8) unter einem Einfallswinkel (α _e) mit der zu vermessenden Probe in Kontakt gebracht wird und eine Mediumsberührung erfährt, und wobei der Messstrahl (8) nach der Mediumsberührung auf einen Detektor (4) abgelenkt wird, wobei sich am Detektor (4) eine um den Einfallswinkel (α_e) des Hauptstrahls (9) gebildete Intensitätsverteilung, welche sich aus den Fresnel'schen Gleichungen ergibt, abbildet, wobei die Lichtquelle (1) den Messstrahl (8) als unpolarisierten Messstrahl (8) abstrahlt und der Messstrahl (8) als unpolarisierter Messstrahl (8) auf den Detektor (4) auftrifft, wobei die räumliche Intensitätsverteilung des Messstrahls (8) auf dem Detektor (4) zur Bestimmung von mindestens zwei Grenzwinkeln der Totalreflexion (α_krit) des Prozessmediums herangezogen wird.

(EN) The invention relates to a method for determining at least two critical angles of total internal reflection in a liquid process medium (10), - wherein a measurement beam (8) is emitted by a light source (1), said measurement beam comprising a main beam (9) and a number of sub-beams (S1, S2, ...), which have different angular differences with respect to the main beam (9), - wherein the measurement beam (8) is radiated into a measurement prism (3) via an illumination optical unit (2), - wherein the measurement prism (3) consists of sapphire, - wherein the measurement prism (3) has at least one measurement surface (31) at which the measurement beam (8) is brought into contact with the sample to be measured at an angle of incidence (α_e) and comes into contact with the medium, and wherein the measurement beam (8) is deflected onto a detector (4) after coming into contact with the medium, wherein an intensity distribution formed around the angle of incidence (α_e) of the main beam (9), which results from Fresnel's equation, is formed on the detector (4), wherein the light source (1) emits the measurement beam (8) as an unpolarised measurement beam (8) and the measurement beam (8) impinges on the detector (4) as an unpolarised measurement beam (8), wherein the spatial intensity distribution of the measurement beam (8) on the detector (4) is used to determine at least two limit angles of the total internal reflection (α_krit) of the process medium.

(FR) L'invention concerne un procédé de détermination d'au moins deux angles critiques de réflexion interne totale dans un milieu de traitement liquide (10) dans lequel : un faisceau de mesure (8) étant émis par une source de lumière (1), ledit faisceau de mesure comprenant un faisceau principal (9) et un certain nombre de sous-faisceaux (S1, S2...), qui présentent des différences angulaires différentes par rapport au faisceau principal (9) ; le faisceau de mesure (8) est dirigé vers un prisme de mesure (3) par l'intermédiaire d'une unité optique d'éclairage (2) ; le prisme de mesure (3) est constitué de saphir ; le prisme de mesure (3) comporte au moins une surface de mesure (31) sur laquelle le faisceau de mesure (8) est mis en contact avec l'échantillon à mesurer selon un angle d'incidence (α_e) et entre en contact avec le milieu, le faisceau de mesure (8) étant dévié vers un détecteur (4) après avoir été en contact avec le milieu ; une distribution d'intensité créée autour de l'angle d'incidence (α_e) du faisceau principal (9), qui résulte de l'équation de Fresnel, se forme sur le détecteur (4) ; la source de lumière (1) émet le faisceau de mesure (8) en tant que faisceau de mesure non polarisé (8) et le faisceau de mesure (8) frappe le détecteur (4) en tant que faisceau de mesure non polarisé (8) ; et la distribution d'intensité spatiale du faisceau de mesure (8) sur le détecteur (4) est utilisée pour déterminer au moins deux angles limites de la réflexion interne totale (α_krit) du milieu de traitement.

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