Search International and National Patent Collections

1. (WO2004003963) PLASMA PROCESSOR WITH ELECTRODE SIMULTANEOUSLY RESPONSIVE TO PLURAL FREQUENCIES

Pub. No.:    WO/2004/003963    International Application No.:    PCT/US2003/019366
Publication Date: Jan 8, 2004 International Filing Date: Jun 20, 2003
IPC: H01J 37/32
Applicants: LAM RESEARCH CORPORATION
VAHEDI, Vahid
LOEWENHARDT, Peter
ELLINGBOE, Bert
KUTHI, Andy
FISCHER, Andreas
Inventors: VAHEDI, Vahid
LOEWENHARDT, Peter
ELLINGBOE, Bert
KUTHI, Andy
FISCHER, Andreas
Title: PLASMA PROCESSOR WITH ELECTRODE SIMULTANEOUSLY RESPONSIVE TO PLURAL FREQUENCIES
Abstract:
A plasma in a vacuum chamber where a workpiece is processed is bounded by a plasma confinement volume including a region between a first electrode simultaneously responsive to power at first and second RF frequencies and a DC grounded second electrode. A DC grounded extension is substantially aligned with the first electrode. A substantial percentage of power at the first frequency is coupled to a path including the first and second electrodes but not the extension while a substantial percentage of power at the second frequency is coupled to a path including the first electrodes and extension, but not the second electrode. Changing the relative powers at the first and second frequencies, as applied to the first electrode, controls DC bias voltage of the first electrode.