Processing

Please wait...

Settings

Settings

Goto Application

1. WO2013006242 - ATOMIC LAYER DEPOSITION OF TRANSITION METAL THIN FILMS

Available information on National Phase entries(more information)
OfficeEntry DateNational NumberNational Status
Germany07.01.2014112012002871Published: 20.03.2014
Germany07.01.20141120120028716
United Kingdom08.01.20141400262.0Published: 26.03.2014
Granted: 25.10.2017
United States of America14.04.201414130987Published: 21.08.2014