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1. EP3722878 - FAST SCAN EXPOSURE METHOD BASED ON DMD

CN109445253Rapid scanning exposure method based on DMD horizontalized state
Appl.Date 25.12.2018
Appl.No 201811588156.0 Applicant HEFEI CHIP FOUNDATION MICRO ELECTRONICS EQUIPMENT CO., LTD. Pub.Kind A,B
Inclusion Criteria IC5
Sole priority inside the family.
Pub.Date 08.03.2019
WO/2020/135343FAST SCAN EXPOSURE METHOD BASED ON DMD
Appl.Date 23.12.2019
Appl.No PCT/CN2019/127498 Applicant CIRCUIT FABOLOGY MICROELECTRONICS EQUIPMENT CO., LTD. Pub.Kind A Pub.Lang zh
Inclusion Criteria IC1
PCT application from which the family originated.
Pub.Date 02.07.2020
EP3722878FAST SCAN EXPOSURE METHOD BASED ON DMD
Appl.Date 23.12.2019
Appl.No 19888237 Applicant CIRCUIT FABOLOGY MICROELECTRONICS EQUIPMENT CO LTD Pub.Kind A1,A4 Pub.Lang en
Inclusion Criteria IC2
National entry of a PCT application.

If this application is not visible in the National Phase tab of the PCT application, its relationship to the PCT application is identified from the PCT or regional filing or publication information of its bibliographic data.

Pub.Date 14.10.2020
JP2021513092DMDに基づく高速走査露光方法
Appl.Date 23.12.2019
Appl.No 2020534844 Applicant 合肥芯碁微電子装備股▲ふん▼有限公司 Pub.Kind A Pub.Lang ja
Inclusion Criteria IC2
National entry of a PCT application.

If this application is not visible in the National Phase tab of the PCT application, its relationship to the PCT application is identified from the PCT or regional filing or publication information of its bibliographic data.

Pub.Date 20.05.2021
EP19888237.5
Appl.Date 01.06.2020
Appl.No 19888237.5
Inclusion Criteria IC3
National entry of a PCT application not found in PATENTSCOPE.