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1. EP3722878 - FAST SCAN EXPOSURE METHOD BASED ON DMD

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Office
European Patent Office
Application Number 19888237
Application Date 23.12.2019
Publication Number 3722878
Publication Date 14.10.2020
Publication Kind A4
IPC
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/2053
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
2053using a laser
G03F 7/704
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70375Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
704Scanned exposure beam, e.g. raster-, rotary- and vector scanning
G03F 7/2057
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
2057using an addressed light valve, e.g. a liquid crystal device
Applicants CIRCUIT FABOLOGY MICROELECTRONICS EQUIPMENT CO LTD
Inventors BIAN HONGFEI
Designated States
Title
(DE) SCHNELLES ABTASTBELICHTUNGSVERFAHREN AUF DER GRUNDLAGE VON DMD
(EN) FAST SCAN EXPOSURE METHOD BASED ON DMD
(FR) PROCÉDÉ D'EXPOSITION À BALAYAGE RAPIDE BASÉ SUR UN DMD
Abstract
(EN)
A rapid scanning exposure method based on a DMD, includes the following operations: S100, controlling light emitted by the laser (11) to irradiate onto the DMD (12), to be reflected through the DMD (12) into the objective lens (13), and to be imaged on photosensitive material on the substrate (14) on the precision platform (15); S200, controlling the precision platform (15) to make a uniform motion in a first direction and to generate pulse signals equidistantly with a set scanning step, and to make a stepping motion or not make a motion in a second direction perpendicular to the first direction; S300, adjusting an angle of deflection of micro mirrors of the DMD after a pattern is refreshed when the DMD (12) detects the pulse signal and before a next pulse signal is detected, to reflect the light emitted by the laser outside the objective lens (13).

(FR)
La présente invention concerne un procédé d'exposition à balayage rapide basé sur un DMD, comprenant les étapes consistant à : S100, commander à la lumière émise par un laser (11) d'irradier un DMD (12), entrer dans une lentille d'objet (13) après avoir été réfléchie par le DMD (12) et former une image sur des matériaux photosensibles d'un substrat (14) sur une plate-forme de précision (15) ; S200, commander à la plate-forme de précision (15) de se déplacer à une vitesse constante le long d'une première direction et de générer de façon équidistante des signaux d'impulsion conformément à une taille de pas prédéfinie pour un balayage, puis commander à la plate-forme de se déplacer pas à pas le long d'une seconde direction perpendiculaire à la première direction ou de ne pas se déplacer ; S300, ajuster l'angle de déviation du micro-miroir du DMD pendant la période suivant la détection par le DMD (12) d'un diagramme de signal d'impulsion rafraîchi et précédant la détection par le DMD (12) d'un signal d'impulsion suivant, de façon à réfléchir la lumière émise par le laser à l'extérieur de la lentille d'objet (13).

Also published as
EP19888237.5