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1. WO2007029822 - MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME

International Application Status
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19.04.2021International Application Status ReportHTML, PDF, XMLPDF, XML
Published International Application
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15.03.2007Initial Publication with ISR( (A1 11/2007))PDF (30p.)PDF (30p.), ZIP(XML + TIFFs)
Search and Examination-Related Documents
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11.03.2008(IB/373) International Preliminary Report on Patentability Chapter IPDF (5p.)PDF (5p.), ZIP(XML + TIFFs)
09.03.2008(ISA/237) Written Opinion of the International Searching AuthorityPDF (4p.)PDF (4p.), ZIP(XML + TIFFs)
09.03.2008English Translation of the Written Opinion of the International Searching AuthorityPDF (4p.)PDF (4p.), ZIP(XML + TIFFs)
Related Documents on file at the International Bureau
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11.03.2008(IB/373) English Translation of International Preliminary Report on Patentability Chapter IPDF (5p.)PDF (5p.), ZIP(XML + TIFFs)
15.03.2007Priority DocumentPDF (24p.)PDF (24p.), ZIP(XML + TIFFs)
15.03.2007(IB/304) Notification Concerning Submission or Transmittal of Priority DocumentPDF (1p.)PDF (1p.), ZIP(XML + TIFFs)
15.03.2007(RO/101) Request formPDF (5p.)