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1. WO1980000496 - NONCONTACTING MEASUREMENT OF HALL EFFECT IN A WAFER

US4190799Noncontacting measurement of hall effect in a wafer
Appl.Date 21.08.1978
Appl.No 05935518 Applicant Bell Telephone Laboratories, Incorporated Related Type IC5
Sole priority inside the family.
Pub.Kind A Pub.Lang en
Pub.Date 26.02.1980
WO/1980/000496NONCONTACTING MEASUREMENT OF HALL EFFECT IN A WAFER
Appl.Date 14.08.1979
Appl.No PCT/US1979/000607 Related Type IC1
PCT application from which the family originated.
Pub.Kind A Pub.Lang en
Pub.Date 20.03.1980
JP1980500582ウエハのホ-ル効果の非接触測定法
Appl.Date 14.08.1979
Appl.No 1979501415 Related Type IC2
National entry of a PCT application.

If this application is not visible in the National Phase tab of the PCT application, its relationship to the PCT application is identified from the PCT or regional filing or publication information of its bibliographic data.

Pub.Kind A Pub.Lang ja
Pub.Date 04.09.1980
EP0008721NONCONTACTING MEASUREMENT OF HALL EFFECT IN A SEMICONDUCTOR WAFER
Appl.Date 16.08.1979
Appl.No 79102983 Applicant WESTERN ELECTRIC COMPANY, INCORPORATED Related Type IC6
Connected by priority field.
Pub.Kind A1,B1 Pub.Lang en
Pub.Date 19.03.1980
CA1129002NONCONTACTING MEASUREMENT OF HALL EFFECT IN A WAFER
Appl.Date 21.08.1979
Appl.No 334212 Related Type IC6
Connected by priority field.
Pub.Kind A Pub.Lang en
Pub.Date 03.08.1982