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1. WO2021160712 - OPTICAL ASSEMBLY, PROJECTION EXPOSURE APPARATUS AND METHOD

Publication Number WO/2021/160712
Publication Date 19.08.2021
International Application No. PCT/EP2021/053278
International Filing Date 11.02.2021
IPC
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G02B 7/185 2021.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
18for prisms; for mirrors
182for mirrors
185with means for adjusting the shape of the mirror surface
H01L 41/08 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
41Piezo-electric devices in general; Electrostrictive devices in general; Magnetostrictive devices in general; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
08Piezo-electric or electrostrictive elements
G02B 26/00 2006.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
26Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating or modulating
CPC
G02B 26/0825
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
26Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
08for controlling the direction of light
0816by means of one or more reflecting elements
0825the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
G02B 5/0891
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
08Mirrors
0891Ultraviolet [UV] mirrors
G02B 5/09
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
08Mirrors
09Multifaceted or polygonal mirrors ; , e.g. polygonal scanning mirrors; Fresnel mirrors
G02B 7/181
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
18for prisms; for mirrors
181with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
G02B 7/185
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
18for prisms; for mirrors
182for mirrors
185with means for adjusting the shape of the mirror surface
G03F 7/70266
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70258Projection system adjustment, alignment during assembly of projection system
70266Adaptive optics, e.g. deformable optical elements for wavefront control
Applicants
  • CARL ZEISS SMT GMBH [DE]/[DE]
Inventors
  • RABA, Andreas
  • LIPPERT, Johannes
  • RAAB, Markus
Agents
  • RAUNECKER, Klaus Peter
Priority Data
10 2020 201 774.313.02.2020DE
Publication Language German (DE)
Filing Language German (DE)
Designated States
Title
(DE) OPTISCHE BAUGRUPPE, PROJEKTIONSBELICHTUNGSANLAGE UND VERFAHREN
(EN) OPTICAL ASSEMBLY, PROJECTION EXPOSURE APPARATUS AND METHOD
(FR) MODULE OPTIQUE, INSTALLATION D'ÉCLAIRAGE PAR PROJECTION ET PROCÉDÉ
Abstract
(DE)
Die Erfindung betrifft eine optische Baugruppe (30) einer Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem optischen Element (31) und einem Aktuator (33) zur Deformation des optischen Elementes (31), wobei der Aktuator (33) von einer vorhandenen Steuerung mit einer Vorspannung beaufschlagt wird. Weiterhin betrifft die Erfindung eine Projektionsbelichtungsanlage (1) für die Halbleiterlithographie, umfassend eine optische Baugruppe (30) nach einem der vorangehenden Ansprüche und ein Verfahren zum Betrieb eines Aktuators (33) zur Deformation eines optischen Elementes (31) für die Halbleiterlithographie, wobei der Aktuator (33) von einer vorhandenen Steuerung mit einer Vorspannung beaufschlagt wird.
(EN)
The invention relates to an optical assembly (30) of a projection exposure apparatus for semiconductor lithography, comprising an optical element (31) and an actuator (33) for deforming the optical element (31), wherein a bias is applied to the actuator (33) by a controller present. Furthermore, the invention relates to a projection exposure apparatus (1) for semiconductor lithography, comprising an optical assembly (30) according to any one of the preceding claims, and a method for operating an actuator (33) for deforming an optical element (31) for semiconductor lithography, wherein a bias is applied to the actuator (33) by a controller present.
(FR)
L'invention concerne un module optique (30) d'une installation d'éclairage par projection pour lithographie de semi-conducteur, comprenant un élément optique (31) et un actionneur (33) pour déformer l'élément optique (31), l'actionneur (33) étant sollicité par une précontrainte par une commande en présence. L'invention concerne par ailleurs une installation d'éclairage par projection (1) pour la lithographie de semi-conducteur, comprenant un module optique (30) selon l'une des revendications précédentes et un procédé pour faire fonctionner un actionneur (33) pour la déformation d'un élément optique (31) pour la lithographie de semi-conducteur, l'actionneur (33) étant sollicité par une précontrainte par une commande en présence.
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