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1. CN109445253 - Rapid scanning exposure method based on DMD horizontalized state

Office
China
Application Number 201811588156.0
Application Date 25.12.2018
Publication Number 109445253
Publication Date 08.03.2019
Grant Number 109445253
Grant Date 05.03.2021
Publication Kind B
IPC
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/2053
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
2053using a laser
G03F 7/704
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70375Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
704Scanned exposure beam, e.g. raster-, rotary- and vector scanning
G03F 7/2057
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
2057using an addressed light valve, e.g. a liquid crystal device
Applicants HEFEI CHIP FOUNDATION MICRO ELECTRONICS EQUIPMENT CO., LTD.
合肥芯碁微电子装备股份有限公司
Inventors BIAN HONGFEI
卞洪飞
ZHAO MEIYUN
赵美云
Agents 合肥天明专利事务所(普通合伙) 34115
合肥天明专利事务所(普通合伙) 34115
Title
(EN) Rapid scanning exposure method based on DMD horizontalized state
(ZH) 一种基于DMD置平状态的快速扫描曝光方法
Abstract
(EN)
The invention relates to a rapid scanning exposure method based on a DMD horizontalized state and can be used for solving the technical problems that 'smear' in scanning type exposure influences increase of scanning step size and then increase of scanning speed and capacity of a scanning type exposure system is influenced. The rapid scanning exposure method comprises the following steps: S100, arranging a precise platform moving at a constant speed in an exposure process, and generating pulses according to a set scanning step size; S200, refreshing a graphic by a DMD micromirror according to pulses triggered by the precise platform, so as to perform modulation; and S300, between the pulses triggered by the precise platform, horizontalizing the DMD micromirror by virtue of a horizontalization command. The rapid scanning exposure method based on the DMD horizontalized state reduces influence of the 'smear' on line width difference of lines with the same line width and in different directions by horizontalizing the DMD micromirror between the two pulses triggered by the precise platform, and the scanning step size can be greatly increased and DMD refresh rate requirement can be reduced, so that scanning speed and capacity are increased.

(ZH)
本发明的一种基于DMD置平状态的快速扫描曝光方法,可解决扫描式曝光中的“拖影”影响了扫描步长的提高,进而影响了扫描式曝光系统的扫描速度和产能提高的技术问题。包括以下步骤:S100、曝光过程中设置精密平台匀速运动,并按照设定的扫描步长产生脉冲;S200、DMD微镜按照精密平台触发的脉冲刷新图形进行调制S300、在精密平台触发的脉冲之间,通过置平命令将DMD微镜置。本发明的基于DMD置平状态的快速扫描曝光方法通过置平两个精密平台脉冲之间DMD微镜,减小了“拖影”的对不同方向上的同等线宽线条的线宽差异的影响,并可以大幅增大扫描步长,减小DMD刷新频率的要求,从而提高扫描速度和产能。

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