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1. WO2020133852 - SUBSTRATE EXPOSURE METHOD AND DEVICE

Publication Number WO/2020/133852
Publication Date 02.07.2020
International Application No. PCT/CN2019/084843
International Filing Date 28.04.2019
IPC
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G02F 1/1303
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour 
13based on liquid crystals, e.g. single liquid crystal display cells
1303Apparatus specially adapted to the manufacture of LCDs
G03F 7/70733
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70691Handling of masks or wafers
70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
Applicants
  • 深圳市华星光电半导体显示技术有限公司 SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. [CN]/[CN]
Inventors
  • 张源锋 ZHANG, Yuanfeng
Agents
  • 深圳翼盛智成知识产权事务所(普通合伙) ESSEN PATENT&TRADEMARK AGENCY
Priority Data
201811605204.226.12.2018CN
Publication Language Chinese (zh)
Filing Language Chinese (ZH)
Designated States
Title
(EN) SUBSTRATE EXPOSURE METHOD AND DEVICE
(FR) PROCÉDÉ ET DISPOSITIF D'EXPOSITION DE SUBSTRAT
(ZH) 一种基板曝光方法及装置
Abstract
(EN) Provided are a substrate exposure method and device, said exposure method comprising: receiving a first target substrate and a second target substrate in a first preset splicing direction; transferring the first target substrate and the second target substrate to a first exposure machine and a second exposure machine, respectively, for first exposure, then transferring the first target substrate to an edge exposure machine for second exposure; transferring the second target substrate to a buffer platform and rotating it to the target splicing direction, then performing second exposure on the edge exposure machine.
(FR) L'invention concerne un procédé et un dispositif d'exposition de substrat, ledit procédé d'exposition consistant à : recevoir un premier substrat cible et un second substrat cible dans une première direction d'épissage prédéfinie ; transférer respectivement le premier substrat cible et le second substrat cible vers une première machine d'exposition et une seconde machine d'exposition pour subir une première exposition, puis transférer le premier substrat cible vers une machine d'exposition de bord pour subir une seconde exposition ; transférer le second substrat cible vers une plateforme tampon et la faire pivoter pour qu'elle se situe dans la direction d'épissage cible, puis effectuer une seconde exposition sur la machine d'exposition de bord.
(ZH) 一种基板曝光方法及装置,曝光方法包括:以第一预设接片方向接收第一目标基板和第二目标基板;将第一目标基板和第二目标基板分别传送至第一曝光机和第二曝光机进行第一次曝光,之后将第一目标基板传送至边缘曝光机进行第二次曝光;将第二目标基板传送至缓存台旋转到目标接片方向后,在边缘曝光机进行第二次曝光。
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