Processing

Please wait...

Settings

Settings

Goto Application

1. WO2020141071 - METHOD FOR CALIBRATING A SCANNING CHARGED PARTICLE MICROSCOPE

Publication Number WO/2020/141071
Publication Date 09.07.2020
International Application No. PCT/EP2019/085710
International Filing Date 17.12.2019
IPC
H01J 37/21 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
21Means for adjusting the focus
H01J 37/28 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron- or ion-diffraction tubes
28with scanning beams
CPC
H01J 2237/1536
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
153Correcting image defects, e.g. stigmators
1536Image distortions due to scanning
H01J 2237/24578
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
245Detection characterised by the variable being measured
24571Measurements of non-electric or non-magnetic variables
24578Spatial variables, e.g. position, distance
H01J 2237/2826
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
26Electron or ion microscopes
282Determination of microscope properties
2826Calibration
H01J 37/222
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
22Optical or photographic arrangements associated with the tube
222Image processing arrangements associated with the tube
H01J 37/28
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron or ion diffraction tubes
28with scanning beams
H01L 22/12
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
22Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
10Measuring as part of the manufacturing process
12for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • DILLEN, Hermanus, Adrianus
  • TEL, Wim, Tjibbo
  • VAN MIERLO, Willem, Louis
Agents
  • PETERS, John Antoine
Priority Data
62/787,10031.12.2018US
62/943,71704.12.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD FOR CALIBRATING A SCANNING CHARGED PARTICLE MICROSCOPE
(FR) PROCÉDÉ D'ÉTALONNAGE D'UN MICROSCOPE À PARTICULES CHARGÉES À BALAYAGE
Abstract
(EN)
A method for calibrating a scanning charged particle microscope, such as a scanning electron microscope (SEM), is provided. The method includes dividing a wafer into a plurality of regions; preparing, on each of the plurality of regions, a pattern including a first periodic structure interleaved with a second periodic structure, the first and second periodic structures having an induced offset; determining an actual pitch the first and second periodic structures and thereby determining actual induced offset on each of the plurality of regions; selecting a plurality of regions from among the plurality of regions; measuring, by the SEM, a pitch of first and second periodic structures on each of the plurality of regions; and performing linearity calibration on the SEM based on the determining and the measuring.
(FR)
L'invention concerne un procédé d'étalonnage d'un microscope à particules chargées à balayage, tel qu'un microscope électronique à balayage (MEB). Le procédé consiste : à diviser une tranche en une pluralité de régions ; à préparer, sur chaque région de la pluralité de régions, un motif comprenant une première structure périodique entrelacée avec une seconde structure périodique, les première et seconde structures périodiques ayant un décalage induit ; à déterminer un pas réel des première et seconde structures périodiques de façon à déterminer un décalage induit réel sur chaque région de la pluralité de régions ; à sélectionner une pluralité de régions parmi la pluralité de régions ; à mesurer, par l'intermédiaire du MEB, un pas de première et seconde structures périodiques sur chaque région de la pluralité de régions ; et à effectuer un étalonnage de linéarité sur le MEB en fonction de la détermination et de la mesure.
Related patent documents
Latest bibliographic data on file with the International Bureau