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1. WO2020135343 - FAST SCAN EXPOSURE METHOD BASED ON DMD

CN109445253Rapid scanning exposure method based on DMD horizontalized state
25.12.2018
Appl.No 201811588156.0 Applicant HEFEI CHIP FOUNDATION MICRO ELECTRONICS EQUIPMENT CO., LTD. Pub.Date 08.03.2019 Pub.Kind A,B Pub.Lang
IC5
Sole priority inside the family.
WO/2020/135343FAST SCAN EXPOSURE METHOD BASED ON DMD
23.12.2019
Appl.No PCT/CN2019/127498 Applicant CIRCUIT FABOLOGY MICROELECTRONICS EQUIPMENT CO., LTD. Pub.Date 02.07.2020 Pub.Kind A Pub.Lang zh
IC1
PCT application from which the family originated.
EP3722878FAST SCAN EXPOSURE METHOD BASED ON DMD
23.12.2019
Appl.No 19888237 Applicant CIRCUIT FABOLOGY MICROELECTRONICS EQUIPMENT CO LTD Pub.Date 14.10.2020 Pub.Kind A1,A4 Pub.Lang en
IC2
National entry of a PCT application.

If this application is not visible in the National Phase tab of the PCT application, its relationship to the PCT application is identified from the PCT or regional filing or publication information of its bibliographic data.

EP19888237.5
01.06.2020
Appl.No 19888237.5
IC3
National entry of a PCT application not found in PATENTSCOPE.
JP2020534844
12.06.2020
Appl.No 2020534844
IC3
National entry of a PCT application not found in PATENTSCOPE.