(12) International Application Status Report

Received at International Bureau: 04 November 2020 (04.11.2020)

Information valid as of: 12 April 2021 (12.04.2021)

Report generated on: 02 August 2021 (02.08.2021)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2021/07990929 April 2021 (29.04.2021) Japanese (JA)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/JP2020/03956521 October 2020 (21.10.2020) Japanese (JA)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
2019-193067 (JP)23 October 2019 (23.10.2019) Priority document received (in compliance with PCT Rule 17.1)
2020-174681 (JP)16 October 2020 (16.10.2020) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
C04B 35/64 (2006.01); B28B 1/30 (2006.01); B33Y 10/00 (2015.01); B33Y 70/00 (2020.01); B33Y 80/00 (2015.01); C04B 35/16 (2006.01); C04B 35/653 (2006.01)

(71) Applicant(s):
CANON KABUSHIKI KAISHA [JP/JP]; 30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo 1468501 (JP) (for all designated states)

(72) Inventor(s):
MURAKAMI Shunsuke; C/O CANON KABUSHIKI KAISHA, 30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo 1468501 (JP)
SHIMIZU Yasushi; C/O CANON KABUSHIKI KAISHA, 30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo 1468501 (JP)
YASUI Nobuhiro; C/O CANON KABUSHIKI KAISHA, 30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo 1468501 (JP)
OSHIMA Kanako; C/O CANON KABUSHIKI KAISHA, 30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo 1468501 (JP)

(74) Agent(s):
ABE Takuma; C/O CANON KABUSHIKI KAISHA, 30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo 1468501 (JP)

(54) Title (EN): CERAMIC ARTICLE PRODUCTION METHOD AND CERAMIC ARTICLE
(54) Title (FR): PROCÉDÉ DE PRODUCTION D'UN ARTICLE EN CÉRAMIQUE, ET ARTICLE EN CÉRAMIQUE
(54) Title (JA): セラミックス物品の製造方法およびセラミックス物品

(57) Abstract:
(EN): The present invention is characterized by including: (i) a step in which a powder having silicon dioxide as the main component thereof and containing an absorber that absorbs light in a wavelength included in an emitted laser beam is arranged; (ii) a step in which the powder is sintered or melted and solidified by irradiating the powder with the laser beam; and (iii) a step in which a molded object formed by repeating steps (i) and (ii) is subjected to a heat treatment of at least 1,470 °C and less than 1,730 °C.
(FR): La présente invention est caractérisée en ce qu'elle comprend : (i) une étape dans laquelle est disposée une poudre ayant du dioxyde de silicium en tant que composant principal de celle-ci et contenant un absorbeur qui absorbe la lumière dans une longueur d'onde incluse dans un faisceau laser émis ; (ii) une étape dans laquelle la poudre est frittée ou fondue et solidifiée par irradiation de la poudre avec le faisceau laser ; et (iii) une étape dans laquelle un objet moulé formé par répétition des étapes (i) et (ii) est soumis à un traitement thermique d'au moins 1470 °C et inférieur à 1730° C
(JA): (i)照射するレーザービームに含まれる波長の光を吸収する吸収体を含み、二酸化ケイ素を主成分とする粉末を配置する工程と、(ii)前記粉末にレーザービームを照射することにより、前記粉末を焼結または溶融および固化させる工程と、(iii)前記工程(i)と(ii)とを繰り返して形成した造形物を1470℃以上1730℃未満で加熱処理する工程と、を有することを特徴とする。

International search report:
Received at International Bureau: 28 December 2020 (28.12.2020) [JP]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, IT, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, WS, ZA, ZM, ZW
European Patent Office (EPO) : AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, RU, TJ, TM