(12) International Application Status Report

Received at International Bureau: 26 September 2020 (26.09.2020)

Information valid as of: 29 October 2020 (29.10.2020)

Report generated on: 23 June 2021 (23.06.2021)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2021/05872001 April 2021 (01.04.2021) English (EN)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/EP2020/07686125 September 2020 (25.09.2020) English (EN)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
LU101420 (LU)27 September 2019 (27.09.2019) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
H05H 1/24 (2006.01); H05H 1/48 (2006.01); H01J 37/32 (2006.01); B23Q 1/44 (2006.01); B23Q 1/70 (2006.01)

(71) Applicant(s):
UNIVERZA V LJUBLJANI [SI/SI]; Kongresni trg 12 1000 Ljubljana (SI) (for all designated states)
JOŽEF STEFAN INSTITUTE [SI/SI]; Jamova cesta 39 1000 Ljubljana (SI) (for all designated states)
CERTOTTICA SCRL [IT/IT]; ZI Villanova 32013 Longarone BL (IT) (for all designated states)

(72) Inventor(s):
DAHLE, Sebastian; Stettiner Str. 1 38678 Clausthal-Zellerfeld (DE)
ŽIGON, Jure; Periška cesta 12 1000 Ljubljana (SI)
PETRIC, Marko; Gerbiceva ulica 38 1000 Ljubljana (SI)
KOVAC, Janez; Pokopališka 8 1000 Ljubljana (SI)
DA CORTÀ, Giuseppe; Via on. Palatini 11 32044 Pieve di Cadore (IT)

(74) Agent(s):
ZACCO GMBH; Bayerstraße 83 80335 Munich (DE)

(54) Title (EN): A PLASMA DEVICE AND A METHOD FOR GENERATING A PLASMA
(54) Title (FR): DISPOSITIF À PLASMA ET PROCÉDÉ DE GÉNÉRATION D'UN PLASMA

(57) Abstract:
(EN): A plasma device (10) comprises a mounting support (11), at least one first lever (12) rotatably mounted on the mounting support (11), at least one second lever (13) rotatably mounted on the at least one first lever (12), and a first electrode (14) attached to the at least one second lever (13).
(FR): Un dispositif à plasma (10) comprend un support de montage (11), au moins un premier levier (12) monté rotatif sur le support de montage (11), au moins un second levier (13) monté rotatif sur ledit au moins un premier levier (12), et une première électrode (14) fixée audit second levier (13).

International search report:
Received at International Bureau: 11 December 2020 (11.12.2020) [EP]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, IT, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, WS, ZA, ZM, ZW
European Patent Office (EPO) : AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, RU, TJ, TM