(12) International Application Status Report

Received at International Bureau: 10 February 2020 (10.02.2020)

Information valid as of: 04 September 2020 (04.09.2020)

Report generated on: 21 January 2021 (21.01.2021)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2020/20433008 October 2020 (08.10.2020) Korean (KO)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/KR2020/00145731 January 2020 (31.01.2020) Korean (KO)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
10-2019-0037450 (KR)29 March 2019 (29.03.2019) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
B32B 7/023 (2019.01); B32B 27/30 (2006.01); B32B 3/26 (2006.01); B32B 27/08 (2006.01); B32B 7/12 (2006.01); G02B 5/30 (2006.01)

(71) Applicant(s):
LG CHEM, LTD. [KR/KR]; 128, Yeoui-daero, Yeongdeungpo-gu, Seoul 07336 (KR) (for all designated states)

(72) Inventor(s):
SHIN, Na Young; LG Chem Research Park, 188, Munji-ro, Yuseong-gu, Daejeon 34122 (KR)
RAH, Kyun Il; LG Chem Research Park, 188, Munji-ro, Yuseong-gu, Daejeon 34122 (KR)
BYUN, Jin Seok; LG Chem Research Park, 188, Munji-ro, Yuseong-gu, Daejeon 34122 (KR)
CHANG, Yeong Rae; LG Chem Research Park, 188, Munji-ro, Yuseong-gu, Daejeon 34122 (KR)
KO, Kyung Moon; LG Chem Research Park, 188, Munji-ro, Yuseong-gu, Daejeon 34122 (KR)

(74) Agent(s):
DANA PATENT LAW FIRM; 5th Floor, New Wing, Gwangsung Bldg., 11, Yeoksam-ro 3-gil, Gangnam-gu, Seoul 06242 (KR)

(54) Title (EN): OPTICAL STACK
(54) Title (FR): EMPILEMENT OPTIQUE
(54) Title (KO): 광학 적층체

(57) Abstract:
(EN): The present invention relates to an optical stack or an anti-redshift layer. The present invention can provide an optical stack or an anti-redshift layer applied thereto, wherein the so-called redshift phenomenon is not induced even when the optical stack is driven or maintained under extremely harsh conditions (for example, extremely high-temperature conditions).
(FR): La présente invention concerne un empilement optique ou une couche anti-décalage vers le rouge. La présente invention peut fournir un empilement optique ou une couche anti-décalage vers le rouge appliquée sur ce dernier, le phénomène dit de décalage vers le rouge n'étant pas induit même lorsque l'empilement optique est excité ou maintenu dans des conditions extrêmement difficiles (par exemple, des conditions de température extrêmement élevée).
(KO): 본 출원은, 광학 적층체 또는 내적화층에 관한 것이다. 본 출원에서는 매우 가혹한 조건(예를 들면, 매우 고온 조건)에서 구동되거나, 유지되는 경우에도 소위 적화 현상이 유발되지 않는 광학 적층체 또는 그에 적용되는 내적화층을 제공할 수 있다.

International search report:
Received at International Bureau: 18 May 2020 (18.05.2020) [KR]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, WS, ZA, ZM, ZW
European Patent Office (EPO) : AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, RU, TJ, TM