(12) International Application Status Report

Received at International Bureau: 11 January 2019 (11.01.2019)

Information valid as of: 09 May 2020 (09.05.2020)

Report generated on: 28 September 2020 (28.09.2020)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2020/11374911 June 2020 (11.06.2020) Chinese (ZH)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/CN2019/07012002 January 2019 (02.01.2019) Chinese (ZH)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
201811483050.4 (CN)05 December 2018 (05.12.2018) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
H01L 51/56 (2006.01); H01L 51/52 (2006.01)

(71) Applicant(s):
WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. [CN/CN]; 305 Room, Building C5, Biolake of Optics Valley No.666 Gaoxin Avenue, Wuhan East Lake High-tech Development Zone Wuhan, Hubei 430079 (CN) (for all designated states)

(72) Inventor(s):
LEE, Jinseok; 305 Room, Building C5, Biolake of Optics Valley No.666 Gaoxin Avenue, East Lake High-Tech Development Zone Wuhan, Hubei 430070 (CN)

(74) Agent(s):
ESSEN PATENT&TRADEMARK AGENCY; Room 1709-1711, Block A, Hailrun Complex No.6021 Shennan Blvd, Futian District Shenzhen, Guangdong 518040 (CN)

(54) Title (EN): MANUFACTURING METHOD FOR OLED DISPLAY PANEL AND OLED DISPLAY PANEL
(54) Title (FR): PROCÉDÉ DE FABRICATION DE PANNEAU D'AFFICHAGE DELO ET PANNEAU D'AFFICHAGE DELO
(54) Title (ZH): OLED 显示面板的制作方法及 OLED 显示面板

(57) Abstract:
(EN): A manufacturing method for an OLED display panel, comprising: providing an array substrate; forming a first ITO layer, a reflective layer, and a second ITO layer in sequence on the array substrate, wherein the film thickness of the second ITO layer is greater than the film thickness of the first ITO layer; forming a patterned photoresist on the second ITO layer; etching the second ITO layer, the reflective layer, and the first ITO layer using the same etching process to form a patterned anode layer; and preparing an OLED light-emitting layer on the anode layer.
(FR): L'invention concerne un procédé de fabrication d'un panneau d'affichage à diodes électroluminescentes organiques (DELO), consistant : à fournir un substrat matriciel ; à former une première couche ITO, une couche réfléchissante, et une seconde couche ITO en séquence sur le substrat matriciel, l'épaisseur de film de la seconde couche ITO étant supérieure à l'épaisseur de film de la première couche ITO ; à former une résine photosensible à motifs sur la seconde couche ITO ; à graver la seconde couche ITO, la couche réfléchissante et la première couche ITO à l'aide du même procédé de gravure pour former une couche d'anode à motifs ; et à préparer une couche électroluminescente DELO sur la couche d'anode.
(ZH): 一种OLED显示面板的制作方法,包括:提供阵列基板;在阵列基板上依次形成第一ITO层、反射层、第二ITO层,其中,所述第二ITO层的膜层厚度大于所述第一ITO层的膜层厚度;在第二ITO层上形成图案化的光刻胶;利用同一道刻蚀工艺对第二ITO层、反射层、第一ITO层进行刻蚀,以形成图案化的阳极层;在所述阳极层上制备OLED发光层。

International search report:
Received at International Bureau: 16 August 2019 (16.08.2019) [CN]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
European Patent Office (EPO) : AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, RU, TJ, TM