(12) International Application Status Report

Received at International Bureau: 13 December 2019 (13.12.2019)

Information valid as of: 18 May 2020 (18.05.2020)

Report generated on: 21 September 2020 (21.09.2020)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2020/11299804 June 2020 (04.06.2020) English (EN)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/US2019/06360227 November 2019 (27.11.2019) English (EN)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
62/772,856 (US)29 November 2018 (29.11.2018) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
A61K 31/05 (2006.01); A61K 36/28 (2006.01); A61K 8/36 (2006.01); A61K 8/38 (2006.01); A61K 8/67 (2006.01); A61P 17/12 (2006.01); A61Q 19/00 (2006.01)

(71) Applicant(s):
STC.UNM [US/US]; 801 University Blvd., SE, Suite 101 Albuquerque, NM 87106 (US) (for all designated states)
K&K BIOTECH [US/US]; 1521 Muriel St. NE Albuquerque, NM 87112 (US) (for all designated states)
TRUJILLO, Kristina [US/US]; 7 Whispering Winds Trail Placitas, NM 87043 (US) (for all designated states)
UILK, Katie [US/US]; 9209 Colima Ave NW Albuquerque, NM 87120 (US) (for all designated states)
VANDER JAGT, David, L. [US/US]; 1728 Vassar NE Albuquerque, NM 87106 (US) (for all designated states)
DECK, Lorraine, M. [US/US]; 4320 Altura Mesa NE Albuquerque, NM 87110 (US) (for all designated states)

(72) Inventor(s):
TRUJILLO, Kristina; 7 Whispering Winds Trail Placitas, NM 87043 (US)
UILK, Katie; 9209 Colima Ave NW Albuquerque, NM 87120 (US)
VANDER JAGT, David, L.; 1728 Vassar NE Albuquerque, NM 87106 (US)
DECK, Lorraine, M.; 4320 Altura Mesa NE Albuquerque, NM 87110 (US)

(74) Agent(s):
COLEMAN, Henry, D.; 714 Colorado Avenue Bridgeport, CT 06605-1601 (US)

(54) Title (EN): COSMETIC COMPOSITIONS AND METHODS OF USE
(54) Title (FR): COMPOSITIONS COSMÉTIQUES ET PROCÉDÉS D'UTILISATION

(57) Abstract:
(EN): The present invention relates to substituted stilbenes and dienones which exhibit unexpected dual activity, as inhibitors of NFKB and as agonists (activators) ofNrf2. In particular, these compounds show dual activity and it has been discovered that these compounds are particularly useful in the treatment of certain cosmetic applications and in rejuvenating and beautifying skin and other keratinous tissue of a subject in need. Cosmetic compositions and methods of using said compositions in combination with other components are disclosed herein.
(FR): La présente invention concerne des stilbènes et des diénones substitués qui présentent une double activité inattendue, en tant qu'inhibiteurs de NFKB et en tant qu'agonistes (activateurs) de Nrf2. En particulier, ces composés présentent une double activité et il a été découvert que ces composés sont particulièrement utiles dans le traitement de certaines applications cosmétiques et pour rajeunir et embellir la peau et d'autres tissus kératiniques d'un sujet qui en a besoin. L'invention concerne également des compositions cosmétiques et des procédés d'utilisation desdites compositions en combinaison avec d'autres éléments.

International search report:
Received at International Bureau: 18 March 2020 (18.03.2020) [RU]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
European Patent Office (EPO) : AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, RU, TJ, TM