(12) International Application Status Report

Received at International Bureau: 06 September 2017 (06.09.2017)

Information valid as of: 12 February 2019 (12.02.2019)

Report generated on: 23 August 2019 (23.08.2019)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2019/04376107 March 2019 (07.03.2019) Japanese (JA)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/JP2017/03079028 August 2017 (28.08.2017) Japanese (JA)


(51) International Patent Classification:
G09F 9/00 (2006.01); G02F 1/13 (2006.01); G02F 1/1333 (2006.01); G02F 1/1335 (2006.01); G09F 9/30 (2006.01); G09F 9/35 (2006.01)

(71) Applicant(s):
SHARP KABUSHIKI KAISHA [JP/JP]; 1, Takumi-cho, Sakai-ku, Sakai City, Osaka 5908522 (JP) (for all designated states)

(72) Inventor(s):
KANEKO, Seiji
KANZAKI, Yohsuke
SAITOH, Takao
MIWA, Masahiko
YAMANAKA, Masaki

(74) Agent(s):
HARAKENZO WORLD PATENT & TRADEMARK; Daiwa Minamimorimachi Building, 2-6, Tenjinbashi 2-chome Kita, Kita-ku, Osaka-shi, Osaka 5300041 (JP)

(54) Title (EN): INFLEXIBLE SUBSTRATE PROVIDED WITH DISPLAY ELEMENT, AND FLEXIBLE DISPLAY DEVICE MANUFACTURING METHOD
(54) Title (FR): SUBSTRAT RIGIDE POURVU D'UN ÉLÉMENT D'AFFICHAGE, ET PROCÉDÉ DE FABRICATION DE DISPOSITIF D'AFFICHAGE SOUPLE
(54) Title (JA): 表示素子を備えた非可撓性基板及び可撓性表示装置の製造方法

(57) Abstract:
(EN): In a right-side PI layer inclined area (RPA), a photosensitive PI layer (10), which covers a ground PI layer (2) exposed from an inorganic film composed of a moisture-proof layer (3), a gate insulation layer (5), a second insulation layer (7), and a third insulation layer (9), is formed.
(FR): Selon la présente invention, dans une zone inclinée de couche PI côté droit (RPA), une couche PI photosensible (10), qui recouvre une couche PI de mise à la terre (2) visible au niveau d'un film inorganique composé d'une couche étanche à l'humidité (3), d'une couche d'isolation de grille (5), d'une deuxième couche d'isolation (7) et d'une troisième couche d'isolation (9), est formée.
(JA): 右側PI層傾斜領域(RPA)においては、防湿層(3)とゲート絶縁層(5)と第2絶縁層(7)と第3絶縁層(9)との無機膜から露出する下地PI層(2)を覆う感光性PI層(10)が形成されている。

International search report:
Received at International Bureau: 04 December 2017 (04.12.2017) [JP]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
European Patent Office (EPO) : AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, RU, TJ, TM