(12) International Application Status Report

Received at International Bureau: 10 November 2017 (10.11.2017)

Information valid as of: 28 January 2019 (28.01.2019)

Report generated on: 18 September 2019 (18.09.2019)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2019/03357821 February 2019 (21.02.2019) Chinese (ZH)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/CN2017/10909002 November 2017 (02.11.2017) Chinese (ZH)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
201710714005.4 (CN)18 August 2017 (18.08.2017) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
H01L 51/52 (2006.01); H01L 51/56 (2006.01)

(71) Applicant(s):
WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. [CN/CN]; 305 Room, Building C5, Biolake of Optics Valley No. 666 Gaoxin Avenue Wuhan East Lake High-Tech Development Zone Wuhan, Hubei 430079 (CN) (for all designated states)

(72) Inventor(s):
XU, Bin; 305 Room, Building C5, Biolake of Optics Valley No. 666 Gaoxin Avenue Wuhan East Lake High-Tech Development Zone Wuhan, Hubei 430079 (CN)

(74) Agent(s):
ESSEN PATENT & TRADEMARK AGENCY; Hailrun Complex Block A Room 1709-1711 No. 6021 Shennan Blvd, Futian District ShenZhen, Guangdong 518040 (CN)

(54) Title (EN): FLEXIBLE SUBSTRATE OF FLEXIBLE OLED DISPLAY PANEL AND MANUFACTURING METHOD THEREOF
(54) Title (FR): SUBSTRAT SOUPLE DE PANNEAU D'AFFICHAGE OLED SOUPLE ET SON PROCÉDÉ DE FABRICATION
(54) Title (ZH): 柔性OLED显示面板的柔性基底及其制备方法

(57) Abstract:
(EN): Provided is a manufacturing method of a flexible substrate of an OLED display panel, comprising the following steps: S10, providing a first polyimide layer (201); S20, manufacturing a first silicon oxide layer (202) on a surface of the first polyimide layer (201); S30, manufacturing a second silicon oxide layer (203) on a surface of the first silicon oxide layer (202); S40, manufacturing an amorphous silicon layer (204) on a surface of the second silicon oxide layer (203); and S50, manufacturing a second polyimide layer (205) on a surface of the amorphous silicon layer (204).
(FR): La présente invention concerne un procédé de fabrication d'un substrat souple d'un panneau d'affichage OLED, comprenant les étapes suivantes consistant : S10, à fournir une première couche de polyimide (201) ; S20, à fabriquer une première couche d'oxyde de silicium (202) sur une surface de la première couche de polyimide (201) ; S30, à fabriquer une seconde couche d'oxyde de silicium (203) sur une surface de la première couche d'oxyde de silicium (202) ; S40, à fabriquer une couche de silicium amorphe (204) sur une surface de la seconde couche d'oxyde de silicium (203) ; et S50, à fabriquer une seconde couche de polyimide (205) sur une surface de la couche de silicium amorphe (204).
(ZH): 一种OLED显示面板的柔性基底制备方法,方法包括以下步骤:S10,提供第一聚酰亚胺层(201);S20,在第一聚酰亚胺层(201)表面制备第一氧化硅层(202);S30,在第一氧化硅层(202)表面制备第二氧化硅层(203);S40,在第二氧化硅层(203)表面制备非晶硅层(204);S50,在非晶硅层(204)表面制备第二聚酰亚胺层(205)。

International search report:
Received at International Bureau: 18 May 2018 (18.05.2018) [CN]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
European Patent Office (EPO) : AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, RU, TJ, TM