(12) International Application Status Report

Received at International Bureau: 30 May 2018 (30.05.2018)

Information valid as of: 02 July 2018 (02.07.2018)

Report generated on: 18 March 2019 (18.03.2019)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2018/21661229 November 2018 (29.11.2018) Japanese (JA)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/JP2018/01928418 May 2018 (18.05.2018) Japanese (JA)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
2017-104312 (JP)26 May 2017 (26.05.2017) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
H01L 21/306 (2006.01); B08B 3/02 (2006.01); C03C 15/00 (2006.01); H01L 21/677 (2006.01)

(71) Applicant(s):
SHARP KABUSHIKI KAISHA [JP/JP]; 1, Takumi-cho, Sakai-ku, Sakai City, Osaka 5908522 (JP) (for all designated states)

(72) Inventor(s):
ITANI Akira

(74) Agent(s):
AKATSUKI UNION PATENT FIRM; 5th Floor, Nittochi Nagoya Bldg., 1-1, Sakae 2-chome, Naka-ku, Nagoya-shi, Aichi 4600008 (JP)

(54) Title (EN): APPARATUS FOR TREATING SUBSTRATE
(54) Title (FR): APPAREIL DE TRAITEMENT DE SUBSTRAT
(54) Title (JA): 基板処理装置

(57) Abstract:
(EN): Provided is a wet etching apparatus 20 comprising: a wet etching bath 21 for supplying an etchant to a to-be-treated surface of a mother glass substrate; a cleaning bath 22 which is disposed downstream of the wet etching bath 21 to supply a cleaning solution to the to-be-treated surface of the mother glass substrate; a replacement bath 23 which is disposed between the wet etching bath 21 and the cleaning bath 22 to supply a replacement fluid for replacing the etchant to the to-be-treated surface of the mother glass substrate; and a substrate transport unit 24 which transports the mother glass substrate in order from the wet etching bath 21 to the replacement bath 23 and then the cleaning bath 22, and transports the mother glass substrate faster in the replacement bath 23 than in the wet etching bath 21 and the cleaning bath 22.
(FR): L'invention concerne un appareil de gravure humide 20 comprenant : un bain de gravure humide 21 pour fournir un agent de gravure à une surface à traiter d'un substrat de verre mère; un bain de nettoyage 22 qui est disposé en aval du bain de gravure humide 21 pour fournir une solution de nettoyage à la surface à traiter du substrat de verre mère; un bain de remplacement 23 qui est disposé entre le bain de gravure humide 21 et le bain de nettoyage 22 pour fournir un fluide de remplacement pour remplacer l'agent de gravure sur la surface à traiter du substrat de verre mère; et une unité de transport de substrat 24 qui transporte le substrat de verre mère dans l'ordre depuis le bain de gravure humide 21 jusqu'au bain de remplacement 23 , puis le bain de nettoyage 22, et transporte le substrat de verre mère plus rapidement dans le bain de remplacement 23 que dans le bain de gravure humide 21 et le bain de nettoyage 22.
(JA): ウェットエッチング装置20は、マザーガラス基板の被処理面にエッチング液を供給するウェットエッチング処理槽21と、ウェットエッチング処理槽21の下流側に配されてマザーガラス基板の被処理面に洗浄液を供給する洗浄槽22と、ウェットエッチング処理槽21と洗浄槽22との間に介在する形で配されてマザーガラス基板の被処理面にエッチング液を置換するための置換液を供給する置換槽23と、ウェットエッチング処理槽21、置換槽23及び洗浄槽22の順でマザーガラス基板を搬送し、置換槽23ではウェットエッチング処理槽21及び洗浄槽22よりマザーガラス基板を速く搬送する基板搬送部24と、を備える。

International search report:
Received at International Bureau: 02 July 2018 (02.07.2018) [JP]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
European Patent Office (EPO) : AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, RU, TJ, TM