(12) International Application Status Report

Received at International Bureau: 21 February 2018 (21.02.2018)

Information valid as of: 30 April 2018 (30.04.2018)

Report generated on: 23 August 2019 (23.08.2019)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2018/15923307 September 2018 (07.09.2018) Japanese (JA)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/JP2018/00406006 February 2018 (06.02.2018) Japanese (JA)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
2017-039427 (JP)02 March 2017 (02.03.2017) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
C01B 11/06 (2006.01)

(71) Applicant(s):
NIPPON LIGHT METAL COMPANY, LTD. [JP/JP]; 2-20, Higashi-shinagawa 2-chome, Shinagawa-ku, Tokyo 1408628 (JP) (for all designated states)

(72) Inventor(s):
OKADA, Tomohide; c/o Kambara Complex, Nippon Light Metal Company, Ltd., 161, Kambara, Shimizu-ku, Shizuoka-shi, Shizuoka 4213297 (JP)
SHIMAZU, Hideo; c/o Kambara Complex, Nippon Light Metal Company, Ltd., 161, Kambara, Shimizu-ku, Shizuoka-shi, Shizuoka 4213297 (JP)
ITO, Hiromichi; c/o Kambara Complex, Nippon Light Metal Company, Ltd., 161, Kambara, Shimizu-ku, Shizuoka-shi, Shizuoka 4213297 (JP)
SUGIYAMA, Yukihiro; c/o Nippon Light Metal Company, Ltd., 2-20, Higashi-shinagawa 2-chome, Shinagawa-ku, Tokyo 1408628 (JP)
TOYAMA, Takashi; c/o Nippon Light Metal Company, Ltd., 2-20, Higashi-shinagawa 2-chome, Shinagawa-ku, Tokyo 1408628 (JP)
SHIMADA, Kaoru; c/o Nippon Light Metal Company, Ltd., 2-20, Higashi-shinagawa 2-chome, Shinagawa-ku, Tokyo 1408628 (JP)
FUJIHISA, Hiroshi; c/o National Institute of Advanced Industrial Science and Technology Tsukuba Central 5, 1-1, Higashi 1-chome, Tsukuba-shi, Ibaraki 3058565 (JP)
TAKEYA, Satoshi; c/o National Institute of Advanced Industrial Science and Technology Tsukuba Central 5, 1-1, Higashi 1-chome, Tsukuba-shi, Ibaraki 3058565 (JP)
MATSUNAGA, Takehiro; c/o National Institute of Advanced Industrial Science and Technology Tsukuba Central 5, 1-1, Higashi 1-chome, Tsukuba-shi, Ibaraki 3058565 (JP)
GOTOH, Yoshito; c/o National Institute of Advanced Industrial Science and Technology Tsukuba Central 5, 1-1, Higashi 1-chome, Tsukuba-shi, Ibaraki 3058565 (JP)

(74) Agent(s):
AOKI, Atsushi; SEIWA PATENT & LAW, Toranomon 37 Mori Bldg., 5-1, Toranomon 3-chome, Minato-ku, Tokyo 1058423 (JP)

(54) Title (EN): CRYSTALLINE FORM OF SODIUM HYPOCHLORITE PENTAHYDRATE AND METHOD FOR PRODUCING SAME
(54) Title (FR): FORME CRISTALLINE D'HYPOCHLORITE DE SODIUM PENTAHYDRATÉ ET SON PROCÉDÉ DE PRODUCTION
(54) Title (JA): 次亜塩素酸ナトリウム5水和物の結晶体およびその製造方法

(57) Abstract:
(EN): Provided are: a crystalline form of sodium hypochlorite pentahydrate which can be stored for a long period of time, wherein the stability of sodium hypochlorite pentahydrate which is effective as an oxidant or a disinfectant has been improved; and a method for producing the same. The crystalline form of sodium hypochlorite pentahydrate has a peak at a position of an angle of diffraction indicated in Table 1 of claim 1 in a range of 10°≤2θ(angle of diffraction)≤65° by powder X-ray diffraction measurements using a CuKα radiation source.
(FR): L'invention concerne : une forme cristalline d'hypochlorite de sodium pentahydraté qui peut être stockée pendant une longue durée, grâce à laquelle la stabilité de l'hypochlorite de sodium pentahydraté, qui est efficace en tant qu'oxydant ou désinfectant, a été améliorée ; et son procédé de production. La forme cristalline d'hypochlorite de sodium pentahydraté présente un pic à une position d'un angle de diffraction indiqué dans le tableau 1 de la revendication 1 dans une plage de 10° ≤ 2θ (angle de diffraction) ≤ 65° par des mesures de diffraction des rayons X sur poudre à l'aide d'une source de rayonnement α du CuK.
(JA): 酸化剤や殺菌剤として有効な次亜塩素酸ナトリウム5水和物の常温付近での安定性を向上させた長期保存が可能な次亜塩素酸ナトリウム5水和物結晶とその製造方法を提供する。 CuKα線源を用いる粉末X線回折測定で、10°≦2θ(回折角)≦65°の範囲において、請求項1の表1に示す回折角の位置にピークが現れる次亜塩素酸ナトリウム5水和物結晶体。

International search report:
Received at International Bureau: 30 April 2018 (30.04.2018) [JP]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
European Patent Office (EPO) : AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, RU, TJ, TM