(12) International Application Status Report

Received at International Bureau: 13 February 2017 (13.02.2017)

Information valid as of: 26 July 2017 (26.07.2017)

Report generated on: 23 September 2019 (23.09.2019)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2017/13924317 August 2017 (17.08.2017) English (EN)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/US2017/01677607 February 2017 (07.02.2017) English (EN)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
62/292,511 (US)08 February 2016 (08.02.2016) Priority document received (in compliance with PCT Rule 17.1)
62/442,350 (US)04 January 2017 (04.01.2017) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
A61N 1/36 (2006.01); A61N 1/04 (2006.01); A61N 1/372 (2006.01)

(71) Applicant(s):
HALO NEURO, INC. [US/US]; 735 Market St., Floor 4 San Francisco, CA 94103 (US) (for all designated states)

(72) Inventor(s):
WINGEIER, Brett; 735 Market St., Floor 4 San Francisco, CA 94103 (US)
RAZEK, Shawn; 735 Market St., Floor 4 San Francisco, CA 94103 (US)
BABCOCK, Kevin; 735 Market St., Floor 4 San Francisco, CA 94103 (US)
FINEBERG, Alan; 735 Market St., Floor 4 San Francisco, CA 94103 (US)
LOWENBERG, Rich; 735 Market St., Floor 4 San Francisco, CA 94103 (US)
WOLBER, Patrick; 735 Market St., Floor 4 San Francisco, CA 94103 (US)

(74) Agent(s):
SCHOX, Jeffrey; 500 3rd Street, Suite 215 San Francisco, CA 94107 (US)

(54) Title (EN): METHOD AND SYSTEM FOR IMPROVING PROVISION OF ELECTRICAL STIMULATION
(54) Title (FR): PROCÉDÉ ET SYSTÈME PERMETTANT D'AMÉLIORER LA FOURNITURE D'UNE STIMULATION ÉLECTRIQUE

(57) Abstract:
(EN): A method and system for providing stimulation to a user, the method including: transitioning a stimulation device from a baseline state to a first impedance monitoring state; during the first impedance monitoring state, guiding, an adjustment of a position of the stimulation device at a head region of the user to satisfy a first impedance criterion; upon satisfaction of the first impedance criterion, transitioning the stimulation device from the first impedance monitoring state to a stimulation regime that comprises a second monitoring state having a second criterion; upon detection of failure to satisfy the second criterion, transitioning the stimulation device from the stimulation regime to the first impedance monitoring state; and upon detecting that a third impedance criterion of the first impedance monitoring state is satisfied, transitioning the stimulation device from the first impedance monitoring state to the stimulation regime.
(FR): L'invention concerne un procédé et un système destinés à la fourniture d'une stimulation à un utilisateur, ce procédé comprenant : le passage d'un dispositif de stimulation d'un état de référence à un premier état de surveillance d'impédance ; pendant le premier état de surveillance d'impédance, le guidage d'un réglage d'une position du dispositif de stimulation au niveau d'une zone tête de l'utilisateur de façon à satisfaire un premier critère d'impédance ; si le premier critère d'impédance est satisfait, le passage du dispositif de stimulation du premier état de surveillance d'impédance à un régime de stimulation qui comprend un deuxième état de surveillance présentant un deuxième critère ; s'il est détecté que le deuxième critère n'est pas satisfait, le passage du dispositif de stimulation du régime de stimulation au premier état de surveillance d'impédance ; et s'il est détecté qu'un troisième critère d'impédance du premier état de surveillance d'impédance est satisfait, le passage du dispositif de stimulation du premier état de surveillance d'impédance au régime de stimulation.

International search report:
Received at International Bureau: 29 April 2017 (29.04.2017) [US]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
European Patent Office (EPO) : AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, RU, TJ, TM