(12) International Application Status Report

Received at International Bureau: 11 August 2008 (11.08.2008)

Information valid as of: 29 May 2009 (29.05.2009)

Report generated on: 03 August 2021 (03.08.2021)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2009/01166122 January 2009 (22.01.2009) English (EN)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/SG2008/00025818 July 2008 (18.07.2008) English (EN)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
60/950,380 (US)18 July 2007 (18.07.2007) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
G06K 9/62 (2006.01)

(71) Applicant(s):
AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH [SG/SG]; 1 Fusionopolis Way #20-10 Connexis Singapore 138632 (SG) (for all designated states except US)
CHEN, Tai Pang [CN/SG]; IPTO, Institute for Infocomm Research 1 Fusionopolis Way #21-01 Connexis South Tower Singapore 138632 (SG) (for US only)
YAU, Wei Yun [MY/SG]; IPTO, Institute for Infocomm Research 1 Fusionopolis Way #21-01 Connexis South Tower Singapore 138632 (SG) (for US only)

(72) Inventor(s):
CHEN, Tai Pang; IPTO, Institute for Infocomm Research 1 Fusionopolis Way #21-01 Connexis South Tower Singapore 138632 (SG)
YAU, Wei Yun; IPTO, Institute for Infocomm Research 1 Fusionopolis Way #21-01 Connexis South Tower Singapore 138632 (SG)

(74) Agent(s):
SCHIWECK, Wolfram; VIERING, JENTSCHURA & PARTNER LLP P.O. Box 1088 Rochor Post Office Rochor Road Singapore 911833 (SG)

(54) Title (EN): METHOD AND DEVICE FOR DETERMINING A SIMILARITY VALUE BETWEEN MINUTIAE TEMPLATES
(54) Title (FR): PROCÉDÉ ET DISPOSITIF POUR DÉTERMINER UNE VALEUR DE SIMILARITÉ ENTRE DES MODÈLES DE DÉTAILS

(57) Abstract:
(EN): Embodiment of the invention provide a method and a device for determining a similarity value between a first template and a second template. A first cluster characteristic for each first cluster of a plurality of first clusters is determined, wherein each first cluster includes a plurality of first minutiae comprised in the first minutiae template. A second cluster characteristic for each second cluster of a plurality of second clusters is determined, wherein each second cluster includes a plurality of second minutiae comprised in the second minutiae template. The similarity value between the first minutiae template and the second minutiae template is determined based on the first cluster characteristics and the second cluster characteristics.
(FR): L'invention concerne un procédé et un dispositif pour déterminer une valeur de similarité entre un premier modèle et un second modèle. Une première caractéristique de groupe pour chaque premier groupe d'une pluralité de premiers groupes est déterminée, chaque premier groupe comprenant une pluralité de premiers détails compris dans le premier modèle de détails. Une seconde caractéristique de grappe pour chaque second groupe d'une pluralité de seconds groupes est déterminée, chaque second groupe comprenant une pluralité de seconds détails compris dans le second modèle de détails. La valeur de similarité entre le premier modèle de détails et le second modèle de détails est déterminée sur la base des premières caractéristiques de groupe et des secondes caractéristiques de groupe.

International search report:
Received at International Bureau: 12 November 2008 (12.11.2008) [AU]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
European Patent Office (EPO) : AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, MD, RU, TJ, TM