(12) International Application Status Report

Received at International Bureau: 30 July 2007 (30.07.2007)

Information valid as of: 13 August 2008 (13.08.2008)

Report generated on: 17 January 2021 (17.01.2021)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2007/14356613 December 2007 (13.12.2007) English (EN)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/US2007/07024301 June 2007 (01.06.2007) English (EN)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
60/810,415 (US)02 June 2006 (02.06.2006) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
B23B 31/30 (2006.01)

(71) Applicant(s):
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, CA 95054 (US) (for all designated states except US)
CHEN, Hung Chih [CN/US]; 430 Waddington Avenue Sunnyvale, CA 94085 (US) (for US only)
OH, Jeonghoon [KR/US]; 880 Fremont Avenue #514 Sunnyvale, CA 94087 (US) (for US only)
NAGENGAST, Andrew [US/US]; 659 Santa Paula Avenue Sunnyvale, CA 94086 (US) (for US only)
ZUNIGA, Steven, M. [US/US]; 351 Los Robles Road Soquel, CA 95073 (US) (for US only)

(72) Inventor(s):
CHEN, Hung Chih; 430 Waddington Avenue Sunnyvale, CA 94085 (US)
OH, Jeonghoon; 880 Fremont Avenue #514 Sunnyvale, CA 94087 (US)
NAGENGAST, Andrew; 659 Santa Paula Avenue Sunnyvale, CA 94086 (US)
ZUNIGA, Steven, M.; 351 Los Robles Road Soquel, CA 95073 (US)

(74) Agent(s):
PATTERSON, B., Todd; Patterson & Sheridan, L.l.p. 3040 Post Oak Blvd., Suite 1500 Houston, Texas 77056-6582 (US)

(54) Title (EN): FAST SUBSTRATE LOADING ON POLISHING HEAD WITHOUT MEMBRANE INFLATION STEP
(54) Title (FR): chargement rapide de substrat sur une tête de polissage sans étape de gonflement de membrane

(57) Abstract:
(EN): The present invention relates to an apparatus and method for improving and speeding up a substrate loading process. The apparatus (200) includes a base member (208) having a bottom surface (209) with a plurality of recesses (210) formed therein and passages (224,225) formed within to pump a control gas in or out. The apparatus also includes a flexible membrane (205) that forms a center chamber (206) and an edge chamber (207) that may be inflated and deflated independently. A substrate support (201) is used to load a substrate (202) on the apparatus.
(FR): La présente invention concerne un appareil et un procédé pour améliorer et accélérer un processus de chargement de substrat. Un mode de réalisation permet d'obtenir un procédé de serrage par ventouse d'un substrat. Le procédé comprend la ventilation d'une chambre centrale d'une membrane flexible configurée pour fixer le substrat, le déplacement du substrat de telle sorte qu'une face arrière du substrat est en contact total avec la membrane flexible et l'aspiration de la chambre centrale pour serrer par ventouse la face arrière du substrat sur la membrane flexible.

International search report:
Received at International Bureau: 03 July 2008 (03.07.2008) [US]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
European Patent Office (EPO) : AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, MD, RU, TJ, TM