(12) International Application Status Report

Received at International Bureau: 24 July 2006 (24.07.2006)

Information valid as of: Not available

Report generated on: 14 December 2019 (14.12.2019)

(10) Publication number: (43) Publication date: (26) Publication language:
WO 2007/00676718 January 2007 (18.01.2007) German (DE)

(21) Application number: (22) Filing date: (25) Filing language:
PCT/EP2006/06404810 July 2006 (10.07.2006) German (DE)

(31) Priority number(s): (32) Priority date(s): (33) Priority status:
10 2005 032 316.2 (DE)11 July 2005 (11.07.2005) Priority document received (in compliance with PCT Rule 17.1)

(51) International Patent Classification:
C08G 73/00 (2006.01); C08G 73/06 (2006.01); G02F 1/00 (2006.01); G02F 1/061 (2006.01); G02F 1/15 (2006.01); G02F 1/361 (2006.01); C09K 9/00 (2006.01); C09K 9/02 (2006.01)

(71) Applicant(s):
SIEMENS AKTIENGESELLSCHAFT [DE/DE]; Wittelsbacherplatz 2 80333 München (DE) (for all designated states except US)
KANITZ, Andreas [DE/DE]; Nackendorf 27 91315 Höchstadt (DE) (for US only)
ROTH, Wolfgang [DE/DE]; Holunderweg 12 91080 Uttenreuth (DE) (for US only)

(72) Inventor(s):
KANITZ, Andreas; Nackendorf 27 91315 Höchstadt (DE)
ROTH, Wolfgang; Holunderweg 12 91080 Uttenreuth (DE)

(74) Common Representative(s):
SIEMENS AKTIENGESELLSCHAFT; Postfach 22 16 34 80506 München (DE)

(54) Title (EN): POLYMER 4,4′-BIPYRIDINIUM STRUCTURES, FORMULATIONS FOR AN ELECTROCHROMIC ACTIVE LAYER, AND APPLICATION THEREFOR
(54) Title (FR): STRUCTURES DE 4,4′-BIPYRIDINIUM POLYMERES, FORMULATIONS DESTINEES A UNE COUCHE ELECTROCHROME ACTIVE ET UTILISATION
(54) Title (DE): POLYMERE 4,4´-BIPYRIDINIUM-STRUKTUREN, FORMULIERUNG FÜR EINE ELEKTROCHROM AKTIVE SCHICHT UND ANWENDUNG DAZU

(57) Abstract:
(EN): The invention relates to material systems wherein electrochemical and/or photochemical parallel reactions are completely avoided by stabilising structural modifications, or repressed by orders of magnitude as a result of the structural modifications. The invention also relates to polymer 4,4'-bipyridinium structures, to formulations based on said structures and used for electrochromic active layers, and to the use of 4,4'-bipyridinium structures for producing organic electrochromic displays.
(FR): L'invention concerne des systèmes de matériaux permettant, de façon entièrement nouvelle, d'éviter complètement des réactions parallèles électrochimiques et/ou photochimiques à l'aide de modifications structurelles, ou de réduire celles-ci de plusieurs ordres de grandeur sous l'effet des modifications structurelles. L'invention concerne plus précisément des structures de 4,4'-bipyridinium polymères, des formulations à base de ces structures, destinées à des couches électrochromes actives, et l'utilisation des structures de 4,4'-bipyridinium dans la fabrication d'écrans électrochromes organiques.
(DE): Durch die Erfindung werden erstmals Materialsysteme vorgeschlagen, in denen elektro- und/oder photochemische Parallelreaktionen durch stabilisierende strukturelle Veränderungen ganz vermieden werden oder deren Zurückdrängung wegen der strukturellen Veränderungen um Größenordnungen erfolgt. Die Erfindung betrifft neuartige polymere 4, 4 ' -Bipyridinium- Strukturen, auf dieser Basis geschaffene Formulierungen für elektrochrom aktive Schichten und die Anwendung der 4,4'- Bipyridinium-Strukturen zur Herstellung organischer elektrochromer Displays.

International search report:
Received at International Bureau: 20 September 2006 (20.09.2006) [EP]

International Report on Patentability (IPRP) Chapter II of the PCT:
Not available

(81) Designated States:
AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
European Patent Office (EPO) : AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR
African Intellectual Property Organization (OAPI) : BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG
African Regional Intellectual Property Organization (ARIPO) : BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW
Eurasian Patent Organization (EAPO) : AM, AZ, BY, KG, KZ, MD, RU, TJ, TM