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1. WO2020104699 - BESCHICHTETE ETFE-FOLIE, VERFAHREN ZUR HERSTELLUNG UND VERWENDUNG DERSELBEN

Veröffentlichungsnummer WO/2020/104699
Veröffentlichungsdatum 28.05.2020
Internationales Aktenzeichen PCT/EP2019/082357
Internationales Anmeldedatum 25.11.2019
IPC
C08J 7/06 2006.01
CChemie; Hüttenwesen
08Organische makromolekulare Verbindungen; deren Herstellung oder chemische Verarbeitung; Massen auf deren Basis
JVerarbeitung; Allgemeine Mischverfahren; Nachbehandlung, soweit nicht von den Unterklassen C08B , C08C , C08F , C08G oder C08H228
7Chemische Behandlung oder Überziehen von aus makromolekularen Stoffen hergestellten Formkörpern
04Überziehen
06mit Massen, die keine makromolekularen Stoffe enthalten
CPC
C08J 2327/18
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G
2327Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
02not modified by chemical after-treatment
12containing fluorine atoms
18Homopolymers or copolymers of tetrafluoroethylene
C08J 7/06
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G
7Chemical treatment or coating of shaped articles made of macromolecular substances
04Coating
06with compositions not containing macromolecular substances
C23C 16/00
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
C23C 16/22
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
22characterised by the deposition of inorganic material, other than metallic material
C23C 16/402
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
22characterised by the deposition of inorganic material, other than metallic material
30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
40Oxides
401containing silicon
402Silicon dioxide
Anmelder
  • FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG EINGETRAGENER VEREIN [DE]/[DE]
Erfinder
  • WILKEN, Ralph
  • OTT, Matthias
  • VISSING, Klaus-Dieter
Vertreter
  • EISENFÜHR SPEISER PATENTANWÄLTE RECHTSANWÄLTE PARTGMBB
Prioritätsdaten
10 2018 129 644.423.11.2018DE
Veröffentlichungssprache Deutsch (DE)
Anmeldesprache Deutsch (DE)
Designierte Staaten
Titel
(DE) BESCHICHTETE ETFE-FOLIE, VERFAHREN ZUR HERSTELLUNG UND VERWENDUNG DERSELBEN
(EN) COATED ETFE FILM, METHOD FOR PRODUCING SAME, AND USE OF SAME
(FR) FILM EN ETFE REVÊTU, PROCÉDÉ DE PRODUCTION ET D'UTILISATION DUDIT FILM
Zusammenfassung
(DE)
Beschichtete ETFE-Folie, wobei der statische Wasserkontaktwinkel auf der Oberfläche der Beschichtung ≤ 60° ist und an der Oberfläche der Beschichtung, gemessen mit XPS, mindestens 1 at% Silicium, 1 at% Titan, 1 at% Zink und/oder 1 at% Aluminium vorhanden ist, bezogen auf die Gesamtzahl der mit XPS gemessenen Atome, mit der Maßgabe, dass, falls von Silicium, Titan, Zink und Aluminium nur Aluminium an der Oberfläche umfasst ist, gilt: an der Oberfläche der Beschichtung ist zwischen 1 at% und 18 at%, bevorzugt zwischen 3 at% und 15 at% und besonders bevorzugt zwischen 6 at% und 10 at% Fluor, das nicht in Form an Tetrafluorethyleneinheiten gebunden ist, umfasst, bezogen auf die Gesamtzahl der mit XPS gemessenen Atome.
(EN)
The invention relates to a coated ETFE film, the static water contact angle on the surface of the coating being ≤ 60° and, measured using XPS, at least 1 at% silicon, 1 at% titanium, 1 at% zinc and/or 1 at% aluminum being present at the surface of the coating, with respect to the total number of atoms measured using XPS, with the stipulation that, if of silicon, titanium, zinc and aluminum only aluminum is comprised at the surface, the following applies: between 1 at% and 18 at%, preferably between 3 at% and 15 at% and particularly preferably between 6 at% and 10 at% fluorine, which is not bonded in the form of tetrafluoroethylene units, is comprised at the surface of the coating, with respect to the total number of atoms measured using XPS.
(FR)
L'invention concerne un film en ETFE revêtu, l'angle statique de contact avec l'eau sur la surface du revêtement étant inférieur ou égal à 60°, et au moins 1 % at. de silicium, 1 % at. de titane, 1 % at. de zinc et/ou 1 % at. d'aluminium étant présents sur la surface du revêtement, mesurés à l'aide d'une XPS, rapporté au nombre total d'atomes mesurés à l'aide d'une XPS, à condition que, dans le cas où la surface ne comprend que de l'aluminium parmi le silicium, le titane, le zinc et l'aluminium, la surface du revêtement comprend entre 1 % at. et 18 % at., de préférence entre 3 % at. et 15 % at., et de manière particulièrement préférée entre 6 % at. et 10 % at. de fluor, qui n'est pas lié sous forme de motifs de tétrafluoréthylène, rapporté au nombre totale d'atomes mesurés à l'aide d'une XPS.
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