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1. (WO2018166444) PHOTOETCHING APPARATUS AND METHOD

Pub. No.:    WO/2018/166444    International Application No.:    PCT/CN2018/078829
Publication Date: Fri Sep 21 01:59:59 CEST 2018 International Filing Date: Wed Mar 14 00:59:59 CET 2018
IPC: G03F 7/20
G03F 9/00
Applicants: SHANGHAI MICRO ELECTRONICS EQUIPMENT(GROUP) CO., LTD.
上海微电子装备(集团)股份有限公司
Inventors: ZHOU, Chang
周畅
YANG, Zhiyong
杨志勇
MA, Linlin
马琳琳
Title: PHOTOETCHING APPARATUS AND METHOD
Abstract:
Disclosed are a photoetching apparatus and method. The photoetching apparatus comprises at least two sets of exposure apparatus and one set of substrate apparatus, wherein the substrate apparatus comprises a substrate table (10) and a substrate (7), wherein the substrate table (10) carries the substrate (7); and the at least two sets of exposure apparatus are symmetrically distributed, in the direction of exposure scanning, above the substrate (7), and form two exposure fields on the substrate (7) to expose the substrate (7) in the exposure fields.