In Bearbeitung

Bitte warten ...

Einstellungen

Einstellungen

Gehe zu Anmeldung

1. WO2018046597 - VORRICHTUNG ZUR ÜBERTRAGUNG VON ELEKTRISCHEN SIGNALEN SOWIE LITHOGRAPHIEANLAGE

Veröffentlichungsnummer WO/2018/046597
Veröffentlichungsdatum 15.03.2018
Internationales Aktenzeichen PCT/EP2017/072460
Internationales Anmeldedatum 07.09.2017
IPC
G03F 7/20 2006.01
GSektion G Physik
03Fotografie; Kinematografie; vergleichbare Techniken unter Verwendung von nicht optischen Wellen; Elektrografie; Holografie
FFotomechanische Herstellung strukturierter oder gemusterter Oberflächen, z.B. zum Drucken, zum Herstellen von Halbleiterbauelementen; Materialien dafür; Kopiervorlagen dafür; Vorrichtungen besonders ausgebildet dafür
7Fotomechanische, z.B. fotolithografische Herstellung von strukturierten oder gemusterten Oberflächen, z.B. Druckflächen; Materialien dafür, z.B. mit Fotolacken ; Vorrichtungen besonders ausgebildet dafür
20Belichten; Vorrichtungen dafür
CPC
G03F 7/70808
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70808Construction details, e.g. housing, load-lock, seals, windows for passing light in- and out of apparatus
G03F 7/70841
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70808Construction details, e.g. housing, load-lock, seals, windows for passing light in- and out of apparatus
70841Constructional issues related to vacuum environment
G03F 7/709
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
709Vibration, e.g. vibration detection, compensation, suppression
G03F 7/70908
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution
G03F 7/70941
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution
70941Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
G03F 7/70991
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70991Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus, shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate, utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids, vacuum
Anmelder
  • CARL ZEISS SMT GMBH [DE]/[DE]
Erfinder
  • HORN, Jan
  • BLEIDISTEL, Sascha
  • BART, Florian
  • HAUF, Markus
Vertreter
  • HORN KLEIMANN WAITZHOFER PATENTANWÄLTE PARTG MBB
Prioritätsdaten
10 2016 217 285.912.09.2016DE
Veröffentlichungssprache Deutsch (DE)
Anmeldesprache Deutsch (DE)
Designierte Staaten
Titel
(DE) VORRICHTUNG ZUR ÜBERTRAGUNG VON ELEKTRISCHEN SIGNALEN SOWIE LITHOGRAPHIEANLAGE
(EN) DEVICE FOR TRANSMITTING ELECTRICAL SIGNALS, AND LITHOGRAPHY SYSTEM
(FR) DISPOSITIF DE TRANSMISSION DE SIGNAUX ÉLECTRIQUES ET INSTALLATION DE LITHOGRAPHIE
Zusammenfassung
(DE)
Vorrichtung (1) zur Übertragung von elektrischen Signalen zwischen einem ersten Schnittstellenelement (11), das an einer ersten Struktur (10) einer Lithographieanlage (100) angeordnet ist, und einem zweiten Schnittstellenelement (21), das an einer zweiten Struktur (20) der Lithographieanlage (100) angeordnet ist, wobei ein elektrischer Leiter (30) das erste Schnittstellenelement (11) und das zweite Schnittstellenelement (21) verbindet und ein den elektrischen Leiter (30) zumindest abschnittsweise umgebender Hohlkörper (40) zur elektromagnetischen Abschirmung des elektrischen Leiters (30) vorgesehen ist, wobei ein Spalt (43) in dem Hohlkörper (40) oder zwischen dem Hohlkörper (40) und einer der Strukturen (10, 20) vorgesehen ist, welcher eine Relativbewegung der ersten Struktur (10) und der zweiten Struktur (20) zur mechanischen Entkopplung der ersten Struktur (10) von der zweiten Struktur (20) zulässt.
(EN)
The invention relates to a device (1) for transmitting electrical signals between a first interface element (11), arranged at a first structure (10) of a lithography system (100), and a second interface element (21), arranged at a second structure (20) of the lithography system (100), an electrical conductor (30) connecting the first interface element (11) and the second interface element (21). The device further has a hollow body (40) which surrounds at least sections of the electrical conductor (30) and which is designed for the electromagnetic shielding of the electrical conductor (30). A gap (43) is provided in the hollow body (40) or between the hollow body (40) and one of the structures (10, 20) and allows a relative movement of the first structure (10) and the second structure (20) to mechanically decouple the first structure (10) from the second structure (20).
(FR)
L'invention concerne un dispositif (1) de transmission de signaux électriques entre un premier élément d'interface (11) qui est agencé sur une première structure (10) d'une installation de lithographie (100) et un second élément d'interface (21) qui est agencé sur une seconde structure (20) de l'installation de lithographie (100). Un conducteur électrique (30) relie le premier élément d'interface (11) et le second élément d'interface (21) et un corps creux (40) entoure au moins par endroits le conducteur électrique (30) pour le blindage électromagnétique du conducteur électrique (30). Une fente (43) ménagée dans le corps creux (40) ou entre le corps creux (40) et une des structures (10, 20) permet un mouvement relatif de la première structure (10) et de la seconde structure (20) pour désolidariser mécaniquement la première structure (10) de la seconde structure (20).
Aktuellste beim Internationalen Büro vorliegende bibliographische Daten