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1. WO2017005912 - VERFAHREN ZUR STEUERUNG EINER STRAHLFÜHRUNGSVORRICHTUNG UND STRAHLFÜHRUNGSVORRICHTUNG

Veröffentlichungsnummer WO/2017/005912
Veröffentlichungsdatum 12.01.2017
Internationales Aktenzeichen PCT/EP2016/066310
Internationales Anmeldedatum 08.07.2016
IPC
G03F 7/20 2006.01
GPhysik
03Fotografie; Kinematografie; vergleichbare Techniken unter Verwendung von nicht optischen Wellen; Elektrografie; Holografie
FFotomechanische Herstellung strukturierter oder gemusterter Oberflächen, z.B. zum Drucken, zum Herstellen von Halbleiterbauelementen; Materialien dafür; Kopiervorlagen dafür; Vorrichtungen besonders ausgebildet dafür
7Fotomechanische, z.B. fotolithografische Herstellung von strukturierten oder gemusterten Oberflächen, z.B. Druckflächen; Materialien dafür, z.B. mit Fotolacken ; Vorrichtungen besonders ausgebildet dafür
20Belichten; Vorrichtungen dafür
CPC
G03F 7/70141
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
70141Illumination system adjustment, alignment during assembly of illumination system
G03F 7/702
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
702Reflective illumination, i.e. reflective optical elements other than folding mirrors
G03F 7/70208
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
70208Multiple illumination paths, e.g. radiation distribution device, multiplexer, demultiplexer for single or multiple projection systems
G03F 7/70991
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70991Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus, shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate, utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids, vacuum
Anmelder
  • CARL ZEISS SMT GMBH [DE]/[DE]
Erfinder
  • PATRA, Michael
Vertreter
  • RAU, SCHNECK & HÜBNER PATENTANWÄLTE RECHTSANWÄLTE PARTGMBB
Prioritätsdaten
10 2015 212 878.409.07.2015DE
Veröffentlichungssprache Deutsch (DE)
Anmeldesprache Deutsch (DE)
Designierte Staaten
Titel
(DE) VERFAHREN ZUR STEUERUNG EINER STRAHLFÜHRUNGSVORRICHTUNG UND STRAHLFÜHRUNGSVORRICHTUNG
(EN) METHOD FOR CONTROLLING A BEAM GUIDING DEVICE, AND BEAM GUIDING DEVICE
(FR) PROCÉDÉ DE COMMANDE D'UN DISPOSITIF DE GUIDAGE DE FAISCEAU ET DISPOSITIF DE GUIDAGE DE FAISCEAU
Zusammenfassung
(DE)
Mittels einer Strahlfuhrungsvorrichtung (28) kann Beleuchtungsstrahlung (5) von unterschiedlichen Strahlungsquellen (4i) zu unterschiedlichen Scannern (3i) gelenkt werden.
(EN)
Illumination radiation (5) emitted by different radiation sources (4i) can be guided towards different scanners (3i) by means of a beam guiding device (28).
(FR)
Dispositif de guidage de faisceau (28) au moyen duquel un faisceau d'éclairage (5) provenant de différentes sources de faisceau (4i) peut être dévié vers différents scanners (3i).
Auch veröffentlicht als
EP2016742199
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