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1. (WO2011157601) ILLUMINATION OPTICAL SYSTEM FOR MICROLITHOGRAPHY AND PROJECTION EXPOSURE SYSTEM WITH AN ILLUMINATION OPTICAL SYSTEM OF THIS TYPE

Pub. No.:    WO/2011/157601    International Application No.:    PCT/EP2011/059427
Publication Date: Fri Dec 23 00:59:59 CET 2011 International Filing Date: Thu Jun 09 01:59:59 CEST 2011
IPC: G03F 7/20
Applicants: CARL ZEISS SMT GMBH
PATRA, Michael
DEGÜNTHER, Markus
LAYH, Michael
Inventors: PATRA, Michael
DEGÜNTHER, Markus
LAYH, Michael
Title: ILLUMINATION OPTICAL SYSTEM FOR MICROLITHOGRAPHY AND PROJECTION EXPOSURE SYSTEM WITH AN ILLUMINATION OPTICAL SYSTEM OF THIS TYPE
Abstract:
An illumination optical system (7) for microlithography is used to guide illumination light (8) from a primary light source (6) to an object field (3). A mirror array (10) of the illumination optical system (7) has a plurality of individual mirrors (11), which can be tilted independently of one another by actuators and are connected to associated tilting actuators (12).A controller (14) is used to activate the actuators (12).A raster module (19) of the illumination optical system (7) has a plurality of raster elements (28, 30) to produce a spatially distributed arrangement of secondary light sources. The raster module (19) is arranged in the region of a plane (20) of the illumination optical system (7), in which an emergent angle (ARx ), at which an illumination light part bundle (15) leaves one of the raster elements (30), is precisely allocated to a location region in the object field (3), on which the illumination light part bundle (15) impinges on the object field (3).The controller (14) is configured in such a way that a specification of a tilting angle for each individual mirror (11) is allocated to a predetermined desired course of illumination angle intensity distributions, with which object field points distributed over the object field (3) are impinged upon. The raster module (19), depending on the respective actual angle of incidence, produces another intensity course in the object field (3). The result is an illumination optical system, in which an illumination intensity over the object field can be influenced in a targeted manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different illumination directions.