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1. (WO2010102649) MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Pub. No.:    WO/2010/102649    International Application No.:    PCT/EP2009/001827
Publication Date: Fri Sep 17 01:59:59 CEST 2010 International Filing Date: Sat Mar 14 00:59:59 CET 2009
IPC: G03F 7/20
Applicants: CARL ZEISS SMT GMBH
DEGUENTHER, Markus
PATRA, Michael
MAJOR, András, G.
Inventors: DEGUENTHER, Markus
PATRA, Michael
MAJOR, András, G.
Title: MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
Abstract:
A microlithographic projection exposure apparatus (10) comprises an optical surface, which may be formed by a plurality of micro-mirrors (Mij) and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device comprises an illumination unit (92) comprising a plurality of illumination members (104, 118) each having a light exit facet (106). An optical imaging system (110) establishes an imaging relationship between an object plane (108) in which at least two light exit facets (106) are arranged, and an image plane (112) which at least substantially coincides with the optical surface. A detector unit (96) measures the property of measuring light after it has interacted with the optical surface and an evaluation unit (102) determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit (96).