(EN) The present invention concerns a method of pulsed bipolar sputtering, the method comprising the steps of: applying a sputtering pulse (-) during a first period of time (T-) / and applying a reverse voltage pulse during a subsequent second period of time (T+). The step of applying the reverse voltage pulse comprises controlling, in particular adjusting, the timing of the reverse voltage pulse (T+). This way high quality sputtering is achieved, in particular for sputtering temperature sensitive materials.
(ZH)
本发明涉及脉冲双极溅射的方法,所述方法包括以下步骤:-在第一时间段(T-)期间应用溅射脉冲(-)/和-在随后的第二时间段(T+)期间应用反转电压脉冲。应用反转电压脉冲的步骤包括控制、特别是调整反转电压脉冲的定时(T+)。这样,实现了高质量溅射,特别是用于溅射温度敏感的材料。