(EN) The present invention concerns a method of pulsed bipolar sputtering, the method comprising the steps of: applying a sputtering pulse (-) during a first period of time (T-) / and applying a reverse voltage pulse during a subsequent second period of time (T+). The step of applying the reverse voltage pulse comprises controlling, in particular adjusting, the timing of the reverse voltage pulse (T+). This way high quality sputtering is achieved, in particular for sputtering temperature sensitive materials.
(ZH)
本发明涉及脉冲双极溅射的方法，所述方法包括以下步骤：-在第一时间段（T-）期间应用溅射脉冲（-）/和-在随后的第二时间段（T+）期间应用反转电压脉冲。应用反转电压脉冲的步骤包括控制、特别是调整反转电压脉冲的定时（T+）。这样，实现了高质量溅射，特别是用于溅射温度敏感的材料。
