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1. (WO2002019364) INDUCTIVELY COUPLED PLASMA USING AN INTERNAL INDUCTIVE ELEMENT

Pub. No.:    WO/2002/019364    International Application No.:    PCT/US2001/027024
Publication Date: Fri Mar 08 00:59:59 CET 2002 International Filing Date: Fri Aug 31 01:59:59 CEST 2001
IPC: H01J 37/32
Applicants: TOKYO ELECTRON LIMITED
TOKYO ELECTRON ARIZONA, INC.
Inventors: BRCKA, Jozef
Title: INDUCTIVELY COUPLED PLASMA USING AN INTERNAL INDUCTIVE ELEMENT
Abstract:
A processing system (12) for processing a substrate with an ionized plasma comprises a processing chamber (13) defining a processing space (14) and including a substrate support (17) therein for supporting a substrate (18) in the processing space. A gas inlet (20) introduces a process gas into said processing space (14) and a plasma source is operable for creating an ionized plasma in the processing space from process gas introduced therein. The plasma source comprises an inductive element (24) operable for coupling electrical energy into the processing space to create an ionized plasma therein. The inductive element (24) winds around a portion of the processing space (14) inside the processing chamber (13) and is encased inside a dielectric material (30) to physically separate the element from the processing space while allowing the element to couple electrical energy into the processing space. Alternatively, the inductive element is coupled to a DC power supply (98) for enhancing the magnetization of the inductive element (24) to reduce the capacitive coupling of energy between the inductive element and the plasma.