البحث في مجموعات البراءات الوطنية والدولية

1. (WO2006118258) EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Pub. No.:    WO/2006/118258    International Application No.:    PCT/JP2006/309002
Publication Date: 09/11/2006 International Filing Date: 28/04/2006
IPC: H01L 21/027
Applicants: NIKON CORPORATION
株式会社ニコン
SHIRAISHI, Kenichi
白石 健一
FUJIWARA, Tomoharu
藤原 朋春
Inventors: SHIRAISHI, Kenichi
白石 健一
FUJIWARA, Tomoharu
藤原 朋春
Title: EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
Abstract:
An exposure method is provided with a step of forming an immersion region (LR) on a substrate (P); a step of exposing the substrate (P) by irradiating the substrate (P) with exposure light (EL) through a liquid (LQ) in the immersion region (LR); and a step of preventing an integrated value of a contact time when the liquid (LQ) of the immersion region (LR) is brought into contact with first regions (S1-S37, 101) on the substrate (P) from exceeding a previously set acceptable value.